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반도체 : 논문 ; 급속 건식 열산화 방법에 의한 초박막 SiO2의 성장과 특성

정상현, 김광호, 김용성, 이수홍

Growth and Properties of Ultra-thin SiO2 Films by Rapid Thermal Dry Oxidation Technique

Sang Hyeon Jeong, Gwang Ho Kim, Yong Seong Kim, Su Hong Lee
J Electr Electron Mater 2004;17(1):21-26.
Published online: January 1, 2004
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Growth and Properties of Ultra-thin SiO2 Films by Rapid Thermal Dry Oxidation Technique
J Electr Electron Mater. 2004;17(1):21-26.   Published online January 1, 2004
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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Growth and Properties of Ultra-thin SiO2 Films by Rapid Thermal Dry Oxidation Technique
J Electr Electron Mater. 2004;17(1):21-26.   Published online January 1, 2004
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