The Characterization for the Ti - Silicide of N+P Junction by 2 Step RTD

Do Yong Choi; Seuk Bum Yoon; Whan Sul Oh

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2단계 RTD 방법에 의한 N+P 접합 티타늄 실리사이드 특성연구

최도영, 윤석범, 오환술

The Characterization for the Ti - Silicide of N+P Junction by 2 Step RTD

Do Yong Choi, Seuk Bum Yoon, Whan Sul Oh

J Electr Electron Mater 1995;8(6):737-742.

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The Characterization for the Ti - Silicide of N+P Junction by 2 Step RTD

J Electr Electron Mater. 1995;8(6):737-742.

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Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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The Characterization for the Ti - Silicide of N+P Junction by 2 Step RTD

J Electr Electron Mater. 1995;8(6):737-742.

Articles

Page Path

2단계 RTD 방법에 의한 N+P 접합 티타늄 실리사이드 특성연구

The Characterization for the Ti - Silicide of N+P Junction by 2 Step RTD

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