Photoelectrochemical etching of GaN using KOH based solution

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KOH용액을 이용한 GaN 박막의 광 전기화학 식각

김우람, 정성훈, 문동찬, 이원상, 김선태

Photoelectrochemical etching of GaN using KOH based solution

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J Electr Electron Mater 1999;12(4):298-304.
Published online: April 1, 1999

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Keywords: Photoelectrochemical etching, 광 전기화학 식각, Etch rate, 식각율, KOH, 수산화 칼륨, GaN, 질화 칼륨, XPS, 광전자 분광선, Surface roughness, 표면 거칠기

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Photoelectrochemical etching of GaN using KOH based solution

J Electr Electron Mater. 1999;12(4):298-304. Published online April 1, 1999

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Photoelectrochemical etching of GaN using KOH based solution

J Electr Electron Mater. 1999;12(4):298-304. Published online April 1, 1999

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KOH용액을 이용한 GaN 박막의 광 전기화학 식각

Photoelectrochemical etching of GaN using KOH based solution

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