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"Etch rate"

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"Etch rate"

Improvement of Etch Rate and Profile by SF6, C4F8 and O2 Gas Modulation
Soon Il Kwon, Kea Joon Yang, Woo Chang Song, Dong Gun Lim
J Electr Electron Mater 2008;21(4):305-310.   Published online April 1, 2008
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Effect of Cerium Ammonium Nitrate and Alumina Abrasive Particles on Polishing Behavior in Ruthenium Chemical Mechanical Planarization
J Electr Electron Mater 2005;18(9):803-809.   Published online September 1, 2005
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Dry Etching of Polysilicon in HBr/O2 Inductively Coupled Plasmas
Seong Jin Beom, O Seong Song, Hye Seong Lee, Jong Jun Kim
J Electr Electron Mater 2004;17(1):1-6.   Published online January 1, 2004
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Photoelectrochemical etching of GaN using KOH based solution
J Electr Electron Mater 1999;12(4):298-304.   Published online April 1, 1999
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