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CI2-Ar 혼합가스를 이용한 GST 박막의 유도결합 플라즈마 식각

민남기, 김만수, Shutov Dmitriy, 김성일, 권광호

Etching Characteristics of GST Thin Films using Inductively Coupled Plasma of Cl2/Ar Gas Mixtures

Nam-Ki Min, Mansu Kim, Shutov Dmitriy, Sungihl Kim, Kwang--Ho Kwon
J Korean Inst Electr Electron Mater Eng 2007;20(10):846-851.
Published online: October 1, 2007
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Etching Characteristics of GST Thin Films using Inductively Coupled Plasma of Cl2/Ar Gas Mixtures
J Korean Inst Electr Electron Mater Eng. 2007;20(10):846-851.   Published online October 1, 2007
DOI: https://doi.org/10.4313/JKEM.2007.20.10.846
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.
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Include:
Etching Characteristics of GST Thin Films using Inductively Coupled Plasma of Cl2/Ar Gas Mixtures
J Korean Inst Electr Electron Mater Eng. 2007;20(10):846-851.   Published online October 1, 2007
DOI: https://doi.org/10.4313/JKEM.2007.20.10.846
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