Etching Characteristics of VO2 Films in Inductively coupled CI2,Ar Plasma

Hee Sung Jung; Sung Ihl Kim; Kwang Ho Kwon

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CI2,Ar 혼합가스를 이용한 VO2 박막의 유도결합 플라즈마 식각

정희성, 김성일, 권광호

Etching Characteristics of VO2 Films in Inductively coupled CI2,Ar Plasma

Hee Sung Jung, Sung Ihl Kim, Kwang Ho Kwon

J Electr Electron Mater 2008;21(8):727-732.
Published online: August 1, 2008

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Keywords: VO2, ICP, Etching, QMS, XPS

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Etching Characteristics of VO2 Films in Inductively coupled CI2,Ar Plasma

J Electr Electron Mater. 2008;21(8):727-732. Published online August 1, 2008

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Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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Etching Characteristics of VO2 Films in Inductively coupled CI2,Ar Plasma

J Electr Electron Mater. 2008;21(8):727-732. Published online August 1, 2008

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CI2,Ar 혼합가스를 이용한 VO2 박막의 유도결합 플라즈마 식각

Etching Characteristics of VO2 Films in Inductively coupled CI2,Ar Plasma

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