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대향타겟식 스퍼터링 장치의 공정 조건에 따른 SiOx 가스 차단막의 특성

배강, 왕태현, 손선영, 김화민, 홍재석

Characteristics of SiOx Gas Barrier Films as a Function of Process Conditions in Facing Target Sputtering (FTS) System

Kang Bae, Tae Hyun Wang, Sun Young Sohn, Hwa Min Kim, Jae Suk Hong
J Electr Electron Mater 2009;22(7):595-601.
Published online: July 1, 2009
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Characteristics of SiOx Gas Barrier Films as a Function of Process Conditions in Facing Target Sputtering (FTS) System
J Electr Electron Mater. 2009;22(7):595-601.   Published online July 1, 2009
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.
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Characteristics of SiOx Gas Barrier Films as a Function of Process Conditions in Facing Target Sputtering (FTS) System
J Electr Electron Mater. 2009;22(7):595-601.   Published online July 1, 2009
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