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AFM을 이용한 나노 패턴 형성과 크기에 따른 광특성 시뮬레이션

황민영, 문경숙, 구상모

Simulations of Optical Characteristics according to the Silicon Oxide Pattern Distance Variation using an Atomic Force Microscopy (AFM)

Min Young Hwang, Kyoung Sook Moon, Sang Mo Koo
J Electr Electron Mater 2010;23(6):440-443.
Published online: June 1, 2010
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Simulations of Optical Characteristics according to the Silicon Oxide Pattern Distance Variation using an Atomic Force Microscopy (AFM)
J Electr Electron Mater. 2010;23(6):440-443.   Published online June 1, 2010
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
Include:
Simulations of Optical Characteristics according to the Silicon Oxide Pattern Distance Variation using an Atomic Force Microscopy (AFM)
J Electr Electron Mater. 2010;23(6):440-443.   Published online June 1, 2010
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