Journal of Electrical and Electronic Materials

Skip to main navigation Skip to main content

KIEEME

OPEN ACCESS

Page Path

HOME
BROWSE ARTICLES
Previous issues

Previous issues

Prev issue

Next issue

Volume 18(4); April 2005

Development of SiGe Heterostructure Epitaxial Growth and Device Fabrication Technology using Reduced Pressure Chemical Vapor Deposition: J Korean Inst Electr Electron Mater Eng 2005;18(4):285-296. Published online April 1, 2005; DOI: https://doi.org/10.4313/JKEM.2005.18.4.285

PDF

28 View
0 Download

CMP Properties of Oxide Film with Various Pad Conditioning Temperatures: J Korean Inst Electr Electron Mater Eng 2005;18(4):297-302. Published online April 1, 2005; DOI: https://doi.org/10.4313/JKEM.2005.18.4.297

PDF

35 View
0 Download

Electrochemical Corrosion and Chemical Mechanical Polishing(CMP) Characteristics of Tungsten Film using Mixed Oxidizer: J Korean Inst Electr Electron Mater Eng 2005;18(4):303-308. Published online April 1, 2005; DOI: https://doi.org/10.4313/JKEM.2005.18.4.303

PDF

38 View
0 Download

Design of 13.56 MHz RFID Tag IC: J Korean Inst Electr Electron Mater Eng 2005;18(4):309-312. Published online April 1, 2005; DOI: https://doi.org/10.4313/JKEM.2005.18.4.309

PDF

40 View
0 Download

A Study on the Characteristics of Stick-slip Friction in CMP: J Korean Inst Electr Electron Mater Eng 2005;18(4):313-320. Published online April 1, 2005; DOI: https://doi.org/10.4313/JKEM.2005.18.4.313

PDF

Citations

Citations to this article as recorded by

Effect of Slurry Film Thickness Variation according to Spray Range Using Ultrasonic Spray Nozzle on Material Removal Rate
Seongnyeong Heo, Seonho Jeong, Minji Kim, Youngwook Park, Haedo Jeong
Journal of the Korean Society for Precision Engineering.2022; 39(9): 675. CrossRef

42 View
0 Download
1 Crossref

Fixed Abrasive Pad with Self-conditioning in CMP Process: J Korean Inst Electr Electron Mater Eng 2005;18(4):321-326. Published online April 1, 2005; DOI: https://doi.org/10.4313/JKEM.2005.18.4.321

PDF

50 View
0 Download

Effect of the Hydrogen Annealing on the Pb(Zr0.52Ti0.48)O3 Film using (Pb0.72La0.28)Ti0.94O3 Buffers: J Korean Inst Electr Electron Mater Eng 2005;18(4):327-329. Published online April 1, 2005; DOI: https://doi.org/10.4313/JKEM.2005.18.4.327

PDF

33 View
0 Download

Effects of the Transition Metal Oxides Substituted for Mg on the Electrical Conductivity of La0.8Sr0.2Ga0.8Mg0.2O(3-δ)-based Electrolytes: J Korean Inst Electr Electron Mater Eng 2005;18(4):330-337. Published online April 1, 2005; DOI: https://doi.org/10.4313/JKEM.2005.18.4.330

PDF

36 View
0 Download

Effects of (100) Orientation of LaNiO3 on the Growth and Ferroelectric Properties of Pb(Zr, Ti)O3 Thin Films: J Korean Inst Electr Electron Mater Eng 2005;18(4):338-343. Published online April 1, 2005; DOI: https://doi.org/10.4313/JKEM.2005.18.4.338

PDF

38 View
0 Download

Electrical and Optical Characteristics of Plasma Display Panel Fabricated by Vacuum In-Line Sealing: J Korean Inst Electr Electron Mater Eng 2005;18(4):344-349. Published online April 1, 2005; DOI: https://doi.org/10.4313/JKEM.2005.18.4.344

PDF

37 View
0 Download

Study of Space Charge of Metal/copper(2)-phthalocyanine Interface: J Korean Inst Electr Electron Mater Eng 2005;18(4):350-356. Published online April 1, 2005; DOI: https://doi.org/10.4313/JKEM.2005.18.4.350

PDF

33 View
0 Download

Structure and Characteristics of Tandem Solar Cell Composed of Dye-sensitized Solar Cell and Thermoelectric Generator: J Korean Inst Electr Electron Mater Eng 2005;18(4):357-362. Published online April 1, 2005; DOI: https://doi.org/10.4313/JKEM.2005.18.4.357

PDF

34 View
0 Download

Comparison of Operating Characteristics between Flux-Lock Type and Resistive Type Superconducting Fault Current Limiters: J Korean Inst Electr Electron Mater Eng 2005;18(4):363-369. Published online April 1, 2005; DOI: https://doi.org/10.4313/JKEM.2005.18.4.363

PDF

39 View
0 Download

AC Loss Characteristic in the Fault Current Limiting Elements of a Coil Type: J Korean Inst Electr Electron Mater Eng 2005;18(4):370-374. Published online April 1, 2005; DOI: https://doi.org/10.4313/JKEM.2005.18.4.370

PDF

Citations

Citations to this article as recorded by

Influence of the conductor’s arrangement and current on the AC loss characteristics of a fault current limiting coil
Z.Y. Li, Y.H. Ma, K. Ryu, S. Choi, K.B. Park, I.S. Oh
Physica C: Superconductivity.2008; 468(15-20): 2063. CrossRef

46 View
0 Download
1 Crossref

The Character of Electron Ionization and Attachment Coefficients in Perfluoropropane(C3F8) Molecular Gas by the Boltzmann Equation: J Korean Inst Electr Electron Mater Eng 2005;18(4):375-380. Published online April 1, 2005; DOI: https://doi.org/10.4313/JKEM.2005.18.4.375

PDF

39 View
1 Download

Measurement of Ar Temperature of Hollow Cathode Discharge Plasma: Jun Hoi Lee, Jae Soo Shin, Sung Jik Lee, Min Soo Lee; J Korean Inst Electr Electron Mater Eng 2005;18(4):381-385. Published online April 1, 2005; DOI: https://doi.org/10.4313/JKEM.2005.18.4.381

PDF

30 View
1 Download

First

Prev

Page of 1

Next

Last

© The Korean Institute of Electrical and Electronic Materials Engineers.

M2PI