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"C-V"

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"C-V"

Low-Power LC-VCO Design Based on Si-NWFET Using Switched Capacitor Array
Seung Hyeok Choi, Han Jung Song
J Electr Electron Mater 2025;38(2):200-206.   Published online March 1, 2025
DOI: https://doi.org/10.4313/JKEM.2025.38.2.11
This paper presents a Si-NWFET-based LC-VCO design that includes an SCA, a P-type Si-NWFET varactor, a 1.2 nH LC tank, and a bias network to linearize the varactor’s C-V characteristics, enabling a wide oscillation frequency tuning range. The circuit achieves a 24 GHz oscillation frequency with a low power consumption of 16.8 μW at a control voltage (Vctrl) of 0.7 V. Phase noise simulations indicate an excellent -109.62 dBc/Hz at a 1 MHz offset, confirming its applicability for RFIC systems. Additionally, the proposed LC-VCO demonstrates stable performance in five major corner process analyses, ensuring robustness under extreme conditions. These results validate the durability of the design and highlight the potential of Si-NWFETbased LC-VCOs as a viable, low-power, highly integrated solution for RFIC applications. The findings underscore the suitability of Si-NWFET technology as a promising alternative to current FinFET and CMOS processes in advanced circuit design.
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An Inspection of Stability for Annealing SiOCH Thin Flim
Yong Heon Park, Min Seok Kim, Chang Su Hwang, Hong Bae Kim
J Electr Electron Mater 2009;22(1):41-46.   Published online January 1, 2009
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Properties of Dielectric Constant and Bonding Mode of Annealed SiOCH Thin Film
Jong Wook Kim, Chang Su Hwang, Yong Heon Park, Hong Bae Kim
J Electr Electron Mater 2009;22(1):47-52.   Published online January 1, 2009
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Electrical Properties of SiOCH Thin Films by Annealing
Min Seok Kim, Chang Su Hwang, Hong Bae Kim
J Electr Electron Mater 2008;21(12):1090-1095.   Published online December 1, 2008
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Properties of SiOCH Thin Film Dielectric constant by BTMSM/O2 Flow Rates
Jong Wook Kim, Chang Su Hwang, Hong Bae Kim
J Electr Electron Mater 2008;21(4):362-367.   Published online April 1, 2008
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Design and Fabrication Process Effects on Electrical Properties in High Capacitance Multilayer Ceramic Capacitor
J Electr Electron Mater 2007;20(2):118-123.   Published online February 1, 2007
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Electrical Properties with Varying CuPc Thickness and Channel Length of the Field-effect Transistor
J Electr Electron Mater 2007;20(1):47-52.   Published online January 1, 2007
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Fabrication and Properties of AIN/SiC Structures using Reactive RF Magnetron Sputtering Method
J Electr Electron Mater 2005;18(11):977-982.   Published online November 1, 2005
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